What is Sulphur Hexafluoride?
- Sulphur hexafluoride is an inorganic gas made up of sulphur and fluorine.
- Sulphur hexafluoride is one of the most stable gases known.
- Sulphur hexafluoride is a very dense gas so it will mainly reside in the lowest layers of air. Exposure will be primarily occupational.
- Sulphur hexafluoride is a weaker eluent than carbon dioxide and is difficult to obtain in adequate purity.
- It provides high dielectric strength and excellent arc-quenching properties.
- The high heat absorbing ability makes sulphur hexafluoride a strong greenhouse gas with a CO2 equivalent contribution to the global warming potential.
Other names – hexafluoro-λ6-sulphane
SF6 | Sulphur Hexafluoride |
Density | 6.17 kg/m³ |
Molecular Weight/ Molar Mass | 146.06 g/mol |
Boiling Point | −50.8 °C |
Melting Point | −64 °C |
Chemical Formula | SF6 |
Table of Contents
Sulphur Hexafluoride Structure – SF6
Physical Properties of Sulphur Hexafluoride – SF6
Odour | Odourless |
Appearance | Colourless gas |
Covalently-Bonded Unit | 1 |
Hydrogen Bond Acceptor | 6 |
Complexity | 62.7 |
Solubility | Poorly soluble in water and readily soluble in nonpolar organic solvents. |
Chemical Properties of Sulphur Hexafluoride – SF6
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- Sulphur hexafluoride dissolves in water and forms sulphuric acid and hydrogen sulphide. The chemical equation is given below.
SF6 + 4H2O → H2SO4 + 6HF - Sulphur hexafluoride reacts with a base like sodium hydroxide and forms sodium sulphate, sodium fluoride and water. The chemical equation is given below.
SF6 + 8NaOH → Na2SO4 + 6NaF + 4H2O
- Sulphur hexafluoride dissolves in water and forms sulphuric acid and hydrogen sulphide. The chemical equation is given below.
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Uses of Sulphur Hexafluoride – SF6
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- Used in magnesium manufacturing as a cover gas and in certain semiconductor production.
- Used as a dating tool and as a tracer of igneous and volcanic fluids in groundwater.
- Used as an electrical insulation, arc quenching and cooling medium in electrical switchgear, transformers and substations.
- Used as etching gasses for plasma etching or as cleaning gasses for cleaning chambers after the etching process in the semiconductor industry.
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