A MOS capacitor is fabricated on p-type Si (Silicon) where the metal work function is
4.1eV and electron affinity of Si is
4.0eV. EC−EF=0.9eV , where
EC and
EF are the conduction band minimum and the Fermi energy levels of Si respectively. Oxide
εr=3.9,εo=8.85×10−14F/cm ,oxide thickness
tox=0.1μm and electronic charge
q=1.6×10−19 C. If the measured flat band voltage of this capacitor is
−1V then the magnitude of the fixed charge at the oxide- semiconductor interface, in
nC/cm2 is
- 6.903