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Question

A MOS capacitor is fabricated on p-type Si (Silicon) where the metal work function is 4.1eV and electron affinity of Si is 4.0eV. ECEF=0.9eV , where EC and EF are the conduction band minimum and the Fermi energy levels of Si respectively. Oxide εr=3.9,εo=8.85×1014F/cm ,oxide thickness tox=0.1μm and electronic charge q=1.6×1019 C. If the measured flat band voltage of this capacitor is1V then the magnitude of the fixed charge at the oxide- semiconductor interface, in nC/cm2 is
  1. 6.903

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Solution

The correct option is A 6.903

eϕm=4.1 eV, electron affinity = 4~ eV\)
ECEFP=0.9 eV
eϕs=electronaffinity+0.9=4.9eV
eϕm=4.1V,ϕs=4.9V
eϕms=eϕmeϕs=4.14.9=0.8V
Cox=ϵoxtox=3.9×8.85×10140.1×104
=34.515×109F/cm2
VFB=ϕmsϕoxCox
ϕoxCox=0.8+1=0.2V

=0.2×34.515×109C/cm2
=6.903 nC/cm2

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