Consider a silicon p-n junction at room temperature having the following parameters:
Doping on the n-side = 1×1017cm−3
Depletion width on the n-side = 0.1μm
Depletion width on the p-side = 1.0μm
Intrinsic carrier concentration = 1.4×1010cm−3 Thermal voltage = 26 mV
Permittivity of free space = 8.85×10−14F−cm−1
Dielectric constant of silicon = 12
The peak electric field in the device is