In the preparation of amorphous silicon, HF acid is used to remove:

M g

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S i O_{2}

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S i

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N o n e

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Solution

The correct option is A $S i O_{2}$
In the preparation of amorphous silicon, HF acid is used to remove leftover Silica( $S i O_{2}$ ).
$S i O_{2} + 4 H F \to S i F_{4} + 2 H_{2} O$

Hence, option B is correct.

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H F

Si of high purity to be used in semiconductor can be prepared by following methods :

I. $S i O_{2} + 2 C \to S i + 2 C O$

II. $S i + 2 C l_{2} \to S i C l_{4}$

$S i C l_{4} + 2 M g \to S i + 2 M g C l_{2}$

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