The temperature dependence of resistances of Cu and undoped Si in the temperature range 300-400 K- is best described byA- Linear increase for Cu- linear increase for Si-B- Linear increase for Cu- exponential increase for Si-C- Linear increase for Cu- exponential decrease for Si-D- Linear decrease for Cu- linear decrease for Si-

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Factors Affecting Resistance & How They Affect

The temperatu...

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The temperature dependence of resistances of Cu and undoped Si in the temperature range $300 - 400 K$ , is best described by

Linear increase for Cu, linear increase for Si.

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Linear increase for Cu, exponential increase for Si.

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Linear increase for Cu, exponential decrease for Si.

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Linear decrease for Cu, linear decrease for Si.

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300 - 400

300 K to 400 K

300 - 400 K

For the cell:

${T l}_{(s)}$ / ${T l}^{+}$ (0.001M)// ${C u}^{+ 2}$ (0.1M)/ ${C u}_{(s)}$ :

$E_{c e l l}$ = 0.83V at 298K, The cell potential can be increased by

T l_{(s)} | T l^{+} (0.001 M) | | C u^{+ 2} (0.1 M) | C u_{(s)}

E_{c e l l} = 0.83 V

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