The temperature dependence of resistances of Cu and undoped Si in the temperature range 300-400 K- is best described byA- Linear increase for Cu- linear increase for Si-B- Linear increase for Cu- exponential increase for Si-C- Linear increase for Cu- exponential decrease for Si-D- Linear decrease for Cu- linear decrease for Si-

261

You visited us 261 times! Enjoying our articles? Unlock Full Access!

Factors Affecting Resistance & How They Affect

The temperatu...

Question

The temperature dependence of resistances of Cu and undoped Si in the temperature range $300 - 400 K$ , is best described by

Linear increase for Cu, linear increase for Si.

No worries! We‘ve got your back. Try BYJU‘S free classes today!

Linear increase for Cu, exponential increase for Si.

No worries! We‘ve got your back. Try BYJU‘S free classes today!

Linear increase for Cu, exponential decrease for Si.

Right on! Give the BNAT exam to get a 100% scholarship for BYJUS courses

Linear decrease for Cu, linear decrease for Si.

No worries! We‘ve got your back. Try BYJU‘S free classes today!

Open in App

Solution

Suggest Corrections

Similar questions

300 - 400

300 K to 400 K

300 - 400 K

For the cell:

${T l}_{(s)}$ / ${T l}^{+}$ (0.001M)// ${C u}^{+ 2}$ (0.1M)/ ${C u}_{(s)}$ :

$E_{c e l l}$ = 0.83V at 298K, The cell potential can be increased by

T l_{(s)} | T l^{+} (0.001 M) | | C u^{+ 2} (0.1 M) | C u_{(s)}

E_{c e l l} = 0.83 V

Join BYJU'S Learning Program