The temperature dependence of resistances of Cu and undoped Si in the temperature range 300−400K, is best described by.
The temperature dependence of resistances of Cu and undoped Si in the temperature range 300-400K, is best described by:
For the cell:
Tl(s)/Tl+ (0.001M)// Cu+2(0.1M)/Cu(s):
Ecell = 0.83V at 298K, The cell potential can be increased by