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B
0.1MKCl solution
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C
0.1MCu(NO3)2 sollution
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D
0.1AgNO3 solution
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Solution
The correct option is C0.1MCu(NO3)2 sollution relative lowring of vapour pressure is a colligative property and depends on the number of solute particles present in the solution.
and as relative lowring of vapour pressure is directly proportional vant hoff factor 0.1MCu(NO3)2 solution has highest i value ultimately, Vapour pressure lowered greatest. thus, has lowest vapour pressure.